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Chemical Vapor Deposition (CVD) Processing

Ensure product quality with targeted and continuous infrared temperature measurements.

Like other applications in the semiconductor industry, your ideal solution depends on your facility; however, there are multiple options that are ideal for integration with your process. In CVD processing, you can rely on products like the Thermalert 4.0 and other spot sensors to get the exact temperature every time.

  • At a Glance
  • Featured Solutions

Following the polishing process, the wafers are etched with their respective circuitry layouts prior to going through the chemical vapor deposition (CVD) process. Here, the wafer is placed in a gas chamber and is continuously heated in various ways, depending on the facility.

As the gaseous reactant is being baked onto the wafer surface, temperature is critical to the final product of the wafer. During this process, a fixed sensor can be placed outside of the gas chamber to continuously take the temperature of the wafer – ensuring nothing damages the wafer.

Infrared Temperature Solutions
  • Dedicated spectral models P3 (3.43 µm) and P7 (7.9 µm) to provide accurate temperature measurements even for very thin plastics even for very low temperature (P3 down to 25° (77 (°F) and P7 10°C (50 °F))
  • Spectal ranges P3 and P7 in one product series cover most common plastic materials

Get more information about Fluke Process Instruments solutions for this application


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