Coating of glass in vacuum deposition processes is used to create thin film solar panels. Silicon Nitride in PECVD processes is used to coat silicon solar cells to form an anti-reflection layer.
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Measuring temperature uniformity in the process is essential to achieve best throughput. The challenge is to measure the substrate temperature, as it is coated and closed within the vacuum chamber.
- Measure product temperature uniformity across the process chamber(s)
- Optimize the process by reducing energy costs and/or increasing throughput
- Troubleshoot the process quickly and easily
- Track process stability
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